paper Review Profile

A superinductor in a deep sub-micron integrated circuit

reviewedReferenceby T. H. Swift, F. Olivieri, G. Aizpurua-Iraola, J. Kirkman, G. M. Noah, M. de Kruijf, F. E. von Horstig, A. Gomez-Saiz, J. J. L. Morton, M. F. Gonzalez-ZalbaCreated 4/7/2026Reviewed under Calibration v0.1-draft1 review
4.5/ 5
Composite

Superinductors are circuit elements characterised by an intrinsic impedance in excess of the superconducting resistance quantum ($R_\text{Q}\approx6.45~$k$Ω$), with applications from metrology and sensing to quantum computing. However, they are typically obtained using exotic materials with high density inductance such as Josephson junctions, superconducting nanowires or twisted two-dimensional materials. Here, we present a superinductor realised within a silicon integrated circuit (IC), exploiting the high kinetic inductance ($\sim 1$~nH/$\square$) of TiN thin films native to the manufacturing process (22-nm FDSOI). By interfacing the superinductor to a silicon quantum dot formed within the same IC, we demonstrate a radio-frequency single-electron transistor (rfSET), the most widely used sensor in semiconductor-based quantum computers. The integrated nature of the rfSET reduces its parasitics which, together with the high impedance, yields a sensitivity improvement of more than two orders of magnitude over the state-of-the-art, combined with a 10,000-fold area reduction. Beyond providing the basis for dense arrays of integrated and high-performance qubit sensors, the realization of high-kinetic-inductance superconducting devices integrated within modern silicon ICs opens many opportunities, including kinetic-inductance detector arrays for astronomy and the study of metamaterials and quantum simulators based on 1D and 2D resonator arrays.

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Internal Consistency
4/5
Mathematical Validity
5/5
Falsifiability
5/5
Clarity
5/5
Novelty
4/5
Completeness
4/5

This is a high-quality experimental paper demonstrating the integration of superconducting TiN thin films within a 22-nm CMOS process to create compact superinductors. The work is methodologically sound, presenting clear experimental data on the characterization of kinetic inductance in TiN films and their application in radio-frequency single-electron transistors (rfSETs). The mathematical framework is appropriate for the experimental context, using established superconductivity theory (Ginzburg-Landau) and circuit analysis. The experimental design is well-conceived, with proper controls and systematic parametric studies of temperature, magnetic field, and current dependencies. The demonstration of >100x sensitivity improvement and 10,000x area reduction compared to state-of-the-art represents significant practical advancement. The paper is exceptionally well-written with clear explanations of both the physics and the technological implications. While the core physics relies on established superconductivity principles, the engineering achievement of integrating these capabilities within standard CMOS processes is genuinely novel and practically important for quantum computing applications.

Strengths

  • +Comprehensive experimental characterization with systematic studies of temperature, magnetic field, and current dependencies
  • +Significant practical improvements: >100x sensitivity enhancement and 10,000x area reduction over state-of-the-art
  • +Clear demonstration of technological integration between superconducting elements and standard CMOS processes

Areas for Improvement

  • -Could benefit from more detailed discussion of the physical mechanisms behind the observed P^-2.5 power dependence in the high-power regime
  • -Additional analysis of the long-term stability and reproducibility of the superconducting properties across different fabrication runs would strengthen the work
  • -More extensive discussion of potential failure modes and operating limits would be valuable for practical applications
  • -Could include comparison with other kinetic inductance materials beyond the brief mentions in the introduction

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